Nanostencil Technique and its Applications to Nanoelectronics

Oscar Vazquez, Research Assistant at LMIS1, EPFL.

 

Abstract: The Nanostencil technique is an emerging nanopatterning method based on shadow mask evaporation. Micro and sub-micron apertures (down to 100-nm scale) are patterned in 100-500 nm thick low-stress silicon nitride membranes. The membrane is brought in close proximity to a substrate and metal is shadow evaporated through the apertures on to a desired substrate. This technique has been successfully applied on full range-wafers, with micro- and nano-apertures in the same device [1][2]. In this presentation we will give an introduction to the technique, the latest improvements achieved by in LMIS and the potential applications for Nanoelectronics [3] and CMOS technology.

About the speaker: Oscar Vazquez recieved his BS degree in Physics Engineering from Monterrey Institute of Technology, Mexico in 2001. Between 2001-2003 he was in the Master of Science program in Nanoscale Science and Technology of Chalmers University of Technology, Gothenburg, Sweden. Between 2003-2003 he was a Master's student and reserch assistant with the Molecular Biophysics group of Prof. Cees Dekker at the Department of Nanoscience of Technical University of Delft, The Netherlands, where he completed his MS thesis.

Currently, Oscar is a Research Assistant at the Microsystems and Nanoengineering Laboratory (LMIS1), EPFL.


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