All-Digital Process Variation Monitor and High-Precision Magnetic Probe System

Thursday, 15 November 2012 at 16:00 in INF 328

Tetsuya Iizuka, Department of Electrical Engineering and Information Systems, University of Tokyo, Japan

Abstract:
In recent nano-scale CMOS processes, a time-domain resolution is becoming superior to a voltage-domain resolution due to the high-speed transistors and the reduced supply voltage. All-digital architectures have attracted attention due to their adequateness to the time-domain architecture, and these architectures are now widely used since they effectively take advantage of the advanced process technologies. These advanced LSIs are widely used not only in consumer electronics but also for security purposes like cryptgrahic chips on IC cards. By measuring and monitoring data dependent electromagnetic emissions of a chip, related secret keys of the chip can be revealed. Therefore, there is a strong demand to evaluate and identify vulnerable electric-magnetic portions of cryptographic LSIs for the protection solution.

In these backgrounds, this presentation introduces two topics including an all-digital implementation of a process variability monitor and an integrated high-precision probe system for near-field magnetic measuremet.
 

About the speaker:
Dr. Tetsuya Iizuka received the B.S., M.S., and Ph.D. degrees in electronic engineering from the University of Tokyo, Japan, in 2002, 2004, and 2007, respectively. Then he worked in industry as a high-speed serial interface circuit designer for two years. He joined University of Tokyo again in 2009, and is currently an Assistant Professor at the Department of Electrical Engineering and Information Systems. His research interests include digitally-assisted analog circuits and VLSI computer-aided design. He is a member of the Institute of Electrical and Electronics Engineers (IEEE) and the Institute of Electronics, Information and Communication Engineers (IEICE). He is a member of the ISSCC Technical Program Committee.